| We invite you to join us at the ASPE SPRING TOPICAL MEETING on: "Precision Mechanical Design and Mechatronics for Sub-50nm Semiconductor Equipment"
時間：April 7 and 8, 2008 – 地點：Lawrence Berkeley National Laboratory, Berkeley, California.
注冊：Register and make your hotel reservation before March 14 cut-off date to take advantage of the "Early-Bird" rates. For Hotel information please go to our website at: http://www.aspe.net/meetings/2008_Spring/2008_Spring.html And if you have already registered, we shall look forward to seeing you in Berkeley.
We have planned a very informative program, presenting system design developments for the major contender technologies for future IC manufacturing, including:
* Marcel Renkens, one of the leading system architects for the ASML EUV Process tools will explain some of the main challenges.
* From NIKON we have a presentation on the route of Double Exposure in 193 nm tools.
* The presentation on Nanoimprint by S.V. Sreenivasan, among others, will indicate developments of this, potentially "disruptive", technology for semiconductor technology.
Combined with the other presentations from leading companies and institutes we will gain a stimulating insight into the developments of Precision Engineering at the nanometer limits.
You can find the complete program and conference registration form at: http://www.aspe.net/meetings/2008_Spring/2008_Spring.html
For additional information contact Erika Deutsch-Layne at erika_layne@aspe.net, or call (919) 839-8444.
American Society for Precision Engineering Annual Meeting, Portland, Oregon
October 19-24, 2008 ---- http://www.aspe.net
ASPE 2008 Spring Topical Meeting on:
"Precision Mechanical Design and Mechatronics for Sub-50 nm Semiconductor Equipment"
April 7 and 8, 2008, Berkeley, California ---- http://www.aspe.net
Erika Deutsch-Layne
Meetings Manager
American Society for Precision Engineering
P.O. Box 10826, Raleigh, NC 27605-0826
301 Glenwood Ave., Suite 205, Raleigh, NC 27603
(919) 839-8444 Telephone
(919) 839-8039 Fax |
